首页> 外国专利> METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME

METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME

机译:含杂环聚合物前体的制备方法,含杂环聚合物前体及其用途

摘要

There are provided a method of manufacturing a heterocycle-containing polymer precursor having a fast cyclization rate, a heterocycle-containing polymer precursor, a composition, a cured film, a method of manufacturing a cured film, and a semiconductor device. There is provided a method of manufacturing a heterocycle-containing polymer precursor using dicarboxylic acid or dicarboxylic acid derivative and diamine as raw materials, including: halogenating the dicarboxylic acid or the dicarboxylic acid derivative by using a halogenating agent and performing reaction with diamine; and adjusting a difference between a molar amount of the halogenating agent and a molar amount of water included in a reaction system before reaction of the halogenating agent to become 2.10 times or less of a total molar amount of the dicarboxylic acid and the dicarboxylic acid derivative as the raw materials.
机译:提供了一种具有快速环化率的含杂环的聚合物前体的制造方法,含杂环的聚合物前体,组合物,固化膜,固化膜的制造方法以及半导体装置。本发明提供了一种以二羧酸或二羧酸衍生物和二胺为原料制造含杂环的聚合物前体的方法,该方法包括:使用卤化剂将二羧酸或二羧酸衍生物卤化并与二胺反应;将卤化剂的反应前的卤化剂的摩尔量与反应体系中所含的水的摩尔量之差调整为二羧酸和二羧酸衍生物的总摩尔量的2.10倍以下。原材料。

著录项

  • 公开/公告号EP3392292A4

    专利类型

  • 公开/公告日2019-01-23

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号EP20160875649

  • 发明设计人 KAWABATA TAKESHI;IWAI YU;SHIBUYA AKINORI;

    申请日2016-12-13

  • 分类号C08G73/10;C08G73/22;G03F7/037;G03F7/038;G03F7/20;

  • 国家 EP

  • 入库时间 2022-08-21 12:27:32

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号