首页> 外国专利> Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun

Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun

机译:用于阴极装置的聚焦电极,电子枪以及包括该电子枪的光刻系统

摘要

The invention relates to a cathode arrangement comprising:a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate;a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; andan adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
机译:本发明涉及一种阴极装置,其包括: 热电子阴极,其包括设置有用于发射电子的发射表面的发射部分和用于容纳材料的储存器,其中该材料在加热时释放出功函数降低粒子,该粒子向发射部分扩散并散发聚焦电极,其包括聚焦表面,该聚焦表面用于聚焦从阴极的发射表面发射的电子;和 可调节的热源,该可调节的热源被配置为将聚焦表面保持在防止降低功函数的颗粒在聚焦表面上积聚的温度。 ListItem>

著录项

  • 公开/公告号US10622188B2

    专利类型

  • 公开/公告日2020-04-14

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号US201615203888

  • 申请日2016-07-07

  • 分类号H01J37/317;G03F7/20;H01J1/28;H01J3/02;H01J1/15;H01J37/075;

  • 国家 US

  • 入库时间 2022-08-21 11:30:34

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