首页> 外国专利> Method for producing a wafer from a hexagonal single crystal ingot by applying a laser beam to form a first production history, an exfoliation layer, and a second production history

Method for producing a wafer from a hexagonal single crystal ingot by applying a laser beam to form a first production history, an exfoliation layer, and a second production history

机译:通过施加激光束以形成第一生产历史,剥离层和第二生产历史从六方晶单晶锭生产晶片的方法

摘要

A method for producing a wafer from a hexagonal single crystal ingot includes: planarizing an upper surface of the hexagonal single crystal ingot; applying a laser beam of such a wavelength as to be transmitted through the ingot, with a focal point positioned in an inside of a region not to be formed with devices of a wafer to be produced from the upper surface of the ingot which has been planarized, to form a production history; and applying a laser beam of such a wavelength as to be transmitted through the hexagonal single crystal ingot with a focal point of the laser beam positioned at a depth corresponding to a thickness of the wafer to be produced from the upper surface of the hexagonal single crystal ingot which has been planarized, to form an exfoliation layer.
机译:由六角形单晶锭制造晶片的方法包括:将六角形单晶锭的上表面平坦化;以及将六角形单晶锭的上表面平坦化。施加波长要透射通过晶锭的激光束,其焦点位于未形成平面的区域的内部,该晶片器件将从已被平坦化的晶锭的上表面制成,形成生产历史;施加波长使其透过六角形单晶锭的波长的激光束,其激光束的焦点位于与从六角形单晶的上表面产生的晶片的厚度相对应的深度。平面化的铸锭形成剥落层。

著录项

  • 公开/公告号US10755946B2

    专利类型

  • 公开/公告日2020-08-25

    原文格式PDF

  • 申请/专利权人 DISCO CORPORATION;

    申请/专利号US201816192250

  • 发明设计人 KAZUYA HIRATA;RYOHEI YAMAMOTO;

    申请日2018-11-15

  • 分类号C30B33/02;H01L21/321;H01L29/16;H01L21/04;H01L21/687;B24B37;B23K26;B24B7/04;C30B29;B24B7/22;

  • 国家 US

  • 入库时间 2022-08-21 11:30:19

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