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Method of reducing effects of reticle heating and/or cooling in a lithographic process
Method of reducing effects of reticle heating and/or cooling in a lithographic process
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机译:减少光刻工艺中掩模版加热和/或冷却影响的方法
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摘要
A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
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