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Optical proximity sensor arrangement and method for producing an optical proximity sensor arrangement

机译:光学接近传感器装置和用于制造光学接近传感器装置的方法

摘要

An optical proximity sensor arrangement comprises a semiconductor substrate (100) with a main surface (101). A first integrated circuit (200) comprises at least one light sensitive component (201). The first integrated circuit is arranged on the substrate at or near the main surface. A second integrated circuit (300) comprises at least one light emitting component (301), and is arranged on the substrate at or near the main surface. A light barrier (400) is arranged between the first and second integrated circuits. The light barrier being designed to block light to be emitted by the at least one light emitting component from directly reaching the at least one light sensitive component. A multilayer mask (500) is arranged on or near the first integrated circuit and comprising a stack (501) of a first layer (502) of first elongated light blocking slats (503) and at least one second layer (504) of second elongated light blocking slats (505). The light blocking slats are arranged in the mask to block light, incident on the mask from a first region of incidence (701), and to pass light, incident on the mask from a second region of incidence (702), from reaching the at least one light sensitive component.
机译:光学接近传感器装置包括具有主表面( 101 )的半导体衬底( 100 )。第一集成电路( 200 )包括至少一个感光组件( 201 )。第一集成电路在主表面处或附近布置在基板上。第二集成电路( 300 )包括至少一个发光组件( 301 ),并布置在主表面上或主表面附近。在第一集成电路和第二集成电路之间布置有光栅( 400 )。挡光板被设计成阻挡将由至少一个发光部件发射的光直接到达至少一个光敏部件。多层掩模( 500 )布置在第一集成电路上或附近,并包括第一层( 502 )的堆栈( 501 )第一细长遮光板( 503 )和第二细长遮光板( 505 )的至少一个第二层( 504 )。遮光板布置在掩模中,以阻挡从第一入射区域( 701 )入射在掩模上的光,并使从第二入射区域(掩模)入射在掩模上的光通过( 702 ),直到到达至少一个感光组件。

著录项

  • 公开/公告号US10629576B2

    专利类型

  • 公开/公告日2020-04-21

    原文格式PDF

  • 申请/专利权人 AMS AG;

    申请/专利号US201715442536

  • 发明设计人 DAVID MEHRL;GREG STOLTZ;

    申请日2017-02-24

  • 分类号H01L27/15;H01L25/16;G01S7/481;G01S17/04;G01S17/02;H01L31/0216;H01L31/0232;H01L31/167;

  • 国家 US

  • 入库时间 2022-08-21 11:29:31

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