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Controlling grain boundaries in high aspect-ratio conductive regions
Controlling grain boundaries in high aspect-ratio conductive regions
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机译:控制高纵横比导电区域中的晶界
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摘要
Methods for forming high aspect-ratio conductive regions of a metallization network with reduced grain boundaries are described. Aspects of the invention include forming a trench in a dielectric material on the substrate. A conductive material is formed in the trench, wherein the conductive material includes a first grain boundary level. Portions of the dielectric material are removed to expose sidewalls of the conductive material. The conductive material is annealed to reduce the first grain boundary level.
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