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Determination of stack difference and correction using stack difference
Determination of stack difference and correction using stack difference
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机译:确定堆叠差异并使用堆叠差异进行校正
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摘要
A method including: obtaining a measurement of a metrology target on a substrate processed using a patterning process, the measurement having been obtained using measurement radiation; and deriving a parameter of interest of the patterning process from the measurement, wherein the parameter of interest is corrected by a stack difference parameter, the stack difference parameter representing an un-designed difference in physical configuration between adjacent periodic structures of the target or between the metrology target and another adjacent target on the substrate.
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