首页> 外国专利> Porous oxide semiconductor including three-dimensionally interconnected nanopores, mesopores, and macropores, method for preparing the porous oxide semiconductor and gas sensor including the porous oxide semiconductor as gas sensing material

Porous oxide semiconductor including three-dimensionally interconnected nanopores, mesopores, and macropores, method for preparing the porous oxide semiconductor and gas sensor including the porous oxide semiconductor as gas sensing material

机译:包括三维互连的纳米孔,中孔和大孔的多孔氧化物半导体,制备多孔氧化物半导体的方法和包括该多孔氧化物半导体作为气体感测材料的气体传感器

摘要

The present invention relates to a porous oxide semiconductor including three-dimensionally interconnected nanopores, mesopores, and macropores, a method for preparing the porous oxide semiconductor, and a gas sensor including the porous oxide semiconductor as a gas sensing material. The nanopores have a diameter of 1 nm to less than 4 nm, the mesopores have a diameter of 4 nm to 50 nm, and the macropores have a diameter of 100 nm to less than 1 μm. The oxide semiconductor gas sensor of the present invention exhibits ultrahigh response and ultrafast response to various analyte gases due to the presence of the controlled nanopores, mesopores, and macropores.
机译:多孔氧化物半导体技术领域本发明涉及一种包括三维互连的纳米孔,中孔和大孔的多孔氧化物半导体,制备该多孔氧化物半导体的方法以及包括该多孔氧化物半导体作为气体感测材料的气体传感器。纳米孔的直径为1nm至小于4nm,中孔的直径为4nm至50nm,大孔的直径为100nm至小于1μm。由于存在受控的纳米孔,中孔和大孔,本发明的氧化物半导体气体传感器表现出对各种分析物气体的超高响应和超快响应。

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