首页> 外国专利> HIGHLY ADHESIVE CVD GROWN BORON DOPED DIAMOND GRADED LAYER ON WC-CO

HIGHLY ADHESIVE CVD GROWN BORON DOPED DIAMOND GRADED LAYER ON WC-CO

机译:WC-CO上的高附着化学气相沉积CVD硼掺杂金刚石层

摘要

Improved thin film coatings, cutting tool materials and processes for cutting tool applications are disclosed. A boron-doped graded diamond thin film for forming a highly adhesive surface coating on a cemented carbide (WC—Co) cutting tool material is provided. The thin film is fabricated in a HFCVD reactor. It is made of a bottom layer of BMCD in contact with a surface layer of the cemented carbide, a top layer made of NCD and a transition layer with a decreasing concentration gradient of boron obtained by changing the reaction conditions through ramp up option in hot filament CVD reactor. The top layer has a low friction coefficient. The bottom layer in the coating substrate interface has better interfacial adhesion through cobalt and boron reactivity and decreased cobalt diffusivity in the diamond. The transition layer has minimized lattice mismatch and sharp stress concentration between the top and bottom layers.
机译:公开了改进的薄膜涂层,切削工具材料和用于切削工具应用的方法。提供了一种硼掺杂的渐变金刚石薄膜,用于在硬质合金(WC-Co)切削刀具材料上形成高粘性表面涂层。该薄膜在HFCVD反应器中制造。它由与硬质合金表面层接触的BMCD底层,由NCD制成的顶层和硼浓度梯度减小的过渡层组成,该过渡层是通过热丝中的升温选择改变反应条件而获得的CVD反应器。顶层具有低摩擦系数。涂层基材界面中的底层通过钴和硼的反应性具有更好的界面附着力,并降低了金刚石中钴的扩散率。过渡层在顶层和底层之间具有最小的晶格失配和尖锐的应力集中。

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