首页> 外国专利> Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same

Electrolytic hard gold plating solution substitution inhibitor and electrolytic hard gold plating solution including same

机译:电解硬金镀液替代抑制剂和包括其的电解硬金镀液

摘要

Electrolytic hard gold plating solution substitution inhibitors containing at least one compound selected from the group consisting of an imidazole compound having a mercapto group, a triazole compound having a mercapto group, and an aliphatic compound having a sulfonic acid group and a mercapto group are provided. Electrolytic hard gold plating solutions containing at least one electrolytic hard gold plating solution substitution inhibitor, a gold salt, a soluble cobalt salt and/or a soluble nickel salt, an organic acid conducting salt, and a chelating agent are also provided.
机译:提供了一种电解硬金镀液置换抑制剂,其含有选自具有巯基的咪唑化合物,具有巯基的三唑化合物以及具有磺酸基和巯基的脂肪族化合物中的至少一种化合物。还提供了包含至少一种电解硬金电镀液取代抑制剂,金盐,可溶性钴盐和/或可溶性镍盐,有机酸传导盐和螯合剂的电解硬金电镀液。

著录项

  • 公开/公告号US10577704B2

    专利类型

  • 公开/公告日2020-03-03

    原文格式PDF

  • 申请/专利权人 METALOR TECHNOLOGIES CORPORATION;

    申请/专利号US201615738398

  • 发明设计人 MASATO FURUKAWA;

    申请日2016-06-01

  • 分类号C25D3/48;C25D3/62;

  • 国家 US

  • 入库时间 2022-08-21 11:27:19

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号