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Techniques based on electromigration characteristics of cell interconnect
Techniques based on electromigration characteristics of cell interconnect
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机译:基于电池互连的电迁移特性的技术
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摘要
In some embodiments, an initial circuit arrangement is provided. The initial circuit arrangement includes cells that include default-rule lines and non-default-rule lines. Line widths of the default-rule lines are selectively increased for a first cell in the initial circuit arrangement, thereby providing a first modified circuit arrangement. A first maximum capacitance value is calculated for the first cell of the first modified circuit arrangement. A second modified circuit arrangement is provided by selectively increasing line widths of the non-default-rule lines in the first modified circuit arrangement. A second maximum capacitance value is calculated for the first cell of the second modified circuit arrangement. A line width of a first non-default-rule line is selectively reduced based on whether the first maximum capacitance value adheres to a predetermined relationship with the second maximum capacitance value. The second modified circuit arrangement is manufactured on a semiconductor substrate.
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