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ROOM-TEMPERATURE FERROMAGNETIC SEMICONDUCTOR LAYERS, ELECTRONIC DEVICES INCLUDING THE SAME, AND METHODS OF FORMING THE SAME
ROOM-TEMPERATURE FERROMAGNETIC SEMICONDUCTOR LAYERS, ELECTRONIC DEVICES INCLUDING THE SAME, AND METHODS OF FORMING THE SAME
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机译:室温铁磁半导体层,包含相同层的电子设备以及形成相同层的方法
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摘要
Ferromagnetic semiconductor layers and methods of forming the same are provided. Electronic devices including the ferromagnetic semiconductor layer are also provided. The ferromagnetic semiconductor layer may include an atomically thin transition metal dichalcogenide layer. The atomically thin transition metal dichalcogenide layer may include dopant metal atoms therein.
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