Method of generating a high-frequency plasma discharge with electron cyclotron wave resonance, the apparatus for this method and the use of this discharge

摘要

The present invention solves the technical problem of modulating the ECWR discharge potential (6), resp. low-pressure and low-temperature plasma, especially with regard to the influence of the kinetic energy of atoms or molecules, resp. ions accelerated to relatively high energy in the range of eV units to tens of eV. In one embodiment, the invention provides a method of generating an ECWR discharge (6), the method comprising the step of applying an additional pulse bias from an external source (14) to a high frequency electrode (5), preferably a tape electrode, via a set of coils, the coil assembly is connected in parallel to the high frequency electrode (5). In other embodiments, the invention provides an apparatus for generating an ECWR discharge (6) comprising a high frequency voltage source (9) inductively coupled to a high frequency electrode (5) via an electrical circuit of coils and capacitors, wherein the high frequency electrode (5) is , preferably the strip electrode, is further connected to an external voltage source (14) via a set of coils, the set of coils being connected in parallel to the high-frequency electrode (5). In other embodiments, the use of the above equipment for low temperature plasma applications and thin film production is disclosed.