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IMPROVING AZIMUTHAL CRITICAL DIMENSION NON-UNIFORMITY FOR DOUBLE PATTERNING PROCESS
IMPROVING AZIMUTHAL CRITICAL DIMENSION NON-UNIFORMITY FOR DOUBLE PATTERNING PROCESS
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机译:改进双拼过程的方位角临界尺寸不均匀性
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摘要
A method for adjusting a position of a showerhead in a processing chamber includes arranging a substrate that includes a plurality of mandrels on a substrate support in the processing chamber and adjusting a position of the showerhead relative to the substrate support. Adjusting the position of the showerhead includes adjusting the showerhead to a tilted position based on data indicating a correlation between the position of the showerhead and azimuthal non-uniformities associated with etching the substrate. The method further includes, with the showerhead in the tilted position as adjusted based on the data, performing a trim step to etch the plurality of mandrels.
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