PROCESSING DEVICE EMPLOYING PLASMA, AND PROCESSING METHOD FOR PERFORMING PROCESS TO IRRADIATE PROCESSING TARGET WITH PLASMA

摘要

In order to provide a processing device and a processing method employing plasma with which stability of maintaining a plasma lighting state is improved, while microwaves having a pulsed microwave power are used as the microwaves for generating the plasma, a processing device (10) employing plasma (25), according to the present invention, is provided with a processing chamber (14) for performing a process to irradiate a processing target (13) with the plasma (25), and a microwave supply unit (17) which supplies microwaves for generating the plasma (25) into the processing chamber (14), wherein the microwave supply unit (17) supplies first microwaves having a pulsed first microwave power in which a difference between a maximum value and a minimum value of the microwave power is at least equal to a first amplitude, and second microwaves having a steady second microwave power with little variation in the microwave power.