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BORON-SILICON CO-DOPED DIAMOND ELECTRODE, PREPARATION METHOD THEREFOR AND USE THEREOF

机译:硼硅共掺杂金刚石电极及其制备方法和用途

摘要

A boron-silicon co-doped diamond electrode, a preparation method therefor and use thereof. The boron-silicon co-doped diamond electrode comprises a substrate and a boron-silicon co-doped diamond layer provided on the substrate. The boron-silicon co-doped diamond electrode can effectively improve the conductivity of a diamond layer by doping boron element into the diamond layer, and can effectively improve the catalytic activity of the diamond layer by doping silicon element. Therefore, boron-silicon co-doping significantly increases the conductivity and catalytic activity of the diamond electrode, and in turn improves the production of ammonia gas through electrocatalytic nitrogen reduction. A preparation method for a boron-silicon co-doped diamond electrode can prepare a boron-silicon co-doped diamond electrode having excellent catalytic performance by means of simple processes, thereby simplifying preparation steps and reducing costs. Also disclosed are application examples where the boron-silicon co-doped diamond electrode is applied to electrocatalytic nitrogen reduction.
机译:硼硅共掺杂金刚石电极,其制备方法及其用途。硼硅共掺杂金刚石电极包括衬底和设置在衬底上的硼硅共掺杂金刚石层。硼硅共掺杂金刚石电极可以通过将硼元素掺杂到金刚石层中来有效地提高金刚石层的电导率,并且可以通过掺杂硅元素来有效地提高金刚石层的催化活性。因此,硼-硅共掺杂显着提高了金刚石电极的电导率和催化活性,进而通过电催化氮还原提高了氨气的产量。一种硼硅共掺杂金刚石电极的制备方法,可以通过简单的工艺制备催化性能优异的硼硅共掺杂金刚石电极,从而简化了制备步骤,降低了成本。还公开了将硼硅共掺杂金刚石电极应用于电催化氮还原的应用实例。

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