首页> 外国专利> VAPOR SOURCE FOR DEPOSITING AN EVAPORATED MATERIAL, NOZZLE FOR A VAPOR SOURCE, VACUUM DEPOSITION SYSTEM, AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL

VAPOR SOURCE FOR DEPOSITING AN EVAPORATED MATERIAL, NOZZLE FOR A VAPOR SOURCE, VACUUM DEPOSITION SYSTEM, AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL

机译:用于沉积蒸发的材料的蒸气源,用于蒸气源的喷嘴,真空沉积系统以及用于沉积蒸发的材料的方法

摘要

Embodiments described herein relate to a vapor source (100) for depositing an evaporated material on a substrate (10) in a vacuum chamber. The vapor source (100) comprises a distribution pipe (110) with a plurality of nozzles, wherein at least one nozzle of the plurality of nozzles comprises a first nozzle section (121) extending along a nozzle axis (A) and having 5 a vapor release opening (123) configured to release a plume (115) of evaporated material, and a second nozzle section (122) downstream of the first nozzle section (121) comprising a shaping passage (125) with a dimension that at least in sections decreases toward a nozzle outlet (126). Embodiments further relate to a nozzle for a vapor source, a vacuum deposition system with a vapor source, and a method for depositing an evaporated material on a substrate 10 in a vacuum chamber.
机译:本文所述的实施例涉及一种蒸气源(100),其用于将蒸发的材料沉积在真空室内的基板(10)上。蒸气源(100)包括具有多个喷嘴的分配管(110),其中,多个喷嘴中的至少一个喷嘴包括沿着喷嘴轴线(A)延伸并且具有5个蒸气的第一喷嘴部分(121)。释放开口(123)构造成释放蒸发材料的羽流(115),并且第二喷嘴部分(122)在第一喷嘴部分(121)的下游,第二喷嘴部分(122)包括成形通道(125),该成形通道的尺寸至少部分地减小朝向喷嘴出口(126)。实施例还涉及用于蒸气源的喷嘴,具有蒸气源的真空沉积系统以及用于在真空室中的基板10上沉积蒸发的材料的方法。

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