首页> 外国专利> CRYSTAL CONTAINING COPPER HALIDE, AND METAL HALIDE AND/OR AMMONIUM HALIDE, CRYSTALLINE THIN-FILM, PRECURSOR SOLUTION THEREOF, AND METHOD FOR PRODUCING CRYSTALLINE THIN-FILM

CRYSTAL CONTAINING COPPER HALIDE, AND METAL HALIDE AND/OR AMMONIUM HALIDE, CRYSTALLINE THIN-FILM, PRECURSOR SOLUTION THEREOF, AND METHOD FOR PRODUCING CRYSTALLINE THIN-FILM

机译:含铜卤化物和金属卤化物和/或卤化铵的结晶,结晶薄膜,其前体溶液以及生产结晶薄膜的方法

摘要

The present invention provides a crystal which exhibits favorable conductivity, can be produced at a processing temperature which is lower than that of the prior art, and contains a copper halide and also contains a halide of a metal selected from the group consisting of alkali metals, magnesium and zinc and/or an ammonium halide. The present invention also provides a transparent crystalline thin-film, a precursor solution thereof, and a method for producing a crystalline thin-film. This crystalline thin-film contains a copper halide and also contains a halide of a metal selected from the group consisting of alkali metals, magnesium and zinc and/or an ammonium halide. The mole ratio of the copper halide to the metal halide and/or ammonium halide is in the range of 100:1 to 100:30.
机译:本发明提供了一种晶体,该晶体显示出良好的导电性,可以在比现有技术低的处理温度下生产,并且包含卤化铜,并且还包含选自碱金属的金属的卤化物,镁和锌和/或卤化铵。本发明还提供了透明的晶体薄膜,其前体溶液以及制备晶体薄膜的方法。该结晶性薄膜包含卤化铜,并且还包含选自碱金属,镁和锌的金属的卤化物和/或卤化铵。卤化铜与金属卤化物和/或卤化铵的摩尔比在100∶1至100∶30的范围内。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号