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POSITIONING METHOD, POSITIONING APPARATUS AND SEQUENCING SYSTEM

机译:定位方法,定位装置和排序系统

摘要

Disclosed are a positioning method, a positioning apparatus and a sequencing system (300). The sequencing system (300) comprises an imaging assembly (110) and a mobile platform (102), wherein the imaging assembly (110) comprises an optical axis (OP), the mobile platform (102) bears a reaction apparatus (200), the stroke of the mobile platform (102) in a first direction is controlled by means of a limiting switch, and the stroke comprises a first limit. The method comprises the steps: (a) moving, by a first step distance, the mobile platform (102) in a direction approaching the first limit, until the distance between a current position of the reaction apparatus (200) and the previous position of the reaction apparatus (200) is less than the first step distance; (b) moving the mobile platform (102) in a direction that is the opposite of the moving direction in step (a); (c) moving the mobile platform (102) in the moving direction in step (a), until the mobile platform (102) reaches the first limit; and (d) moving, by a preset distance, the mobile platform (102) in the direction that is the opposite of the moving direction in step (a), so that the positions of the optical axis (OP) and the reaction apparatus (200) satisfy a preset relationship. According to the method, the quick and precise positioning of the mobile platform (102) can be realized by means of moving back and forth in the first direction, such that the positions of the optical axis (OP) and the reaction apparatus (200) satisfy a preset relationship.
机译:公开了一种定位方法,定位设备和排序系统(300)。测序系统(300)包括成像组件(110)和移动平台(102),其中成像组件(110)包括光轴(OP),移动平台(102)承载反应设备(200),通过限制开关控制移动平台(102)在第一方向上的行程,该行程包括第一极限。该方法包括以下步骤:(a)在接近第一极限的方向上移动移动平台(102)第一距离,直到反应装置(200)的当前位置和反应器的先前位置之间的距离。反应装置(200)小于第一步距。 (b)沿与步骤(a)中的移动方向相反的方向移动移动平台(102); (c)在步骤(a)中沿移动方向移动移动平台(102),直到移动平台(102)达到第一极限为止; (d)将移动平台(102)沿与步骤(a)中的移动方向相反的方向移动预设距离,以使光轴(OP)和反应设备的位置200)满足预设关系。根据该方法,可以通过在第一方向上来回移动来实现移动平台(102)的快速和精确的定位,使得光轴(OP)和反应设备(200)的位置满足预设关系。

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