[Problem] To provide an etching end-point detecting device, for example, which does not require a spectroscope for detecting an end-point of etching. [Solution] An etching end-point detecting device 20 comprises: a process log acquiring unit 21 which acquires process log data of a substrate processing device 10 that subjects a substrate W disposed in a chamber 1 to processing, such as plasma processing; and a detecting unit 22 which, on the basis of the process log data acquired by the process log acquiring unit, creates input data other than a measurement value concerning light generated in the chamber, detects an end-point of etching in the substrate processing device on the basis of the input data. The detecting unit is provided with a classifier 25 which is generated by means of machine learning and into which the input data is input, wherein the classifier produces an output indicating a point before or after the end-point of etching in the substrate processing device.
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