首页> 外国专利> BASE MATERIAL RETENTION DEVICE, BASE MATERIAL RETENTION METHOD, AND CURVED SURFACE SCREEN PRINTING DEVICE EQUIPPED WITH BASE MATERIAL RETENTION DEVICE

BASE MATERIAL RETENTION DEVICE, BASE MATERIAL RETENTION METHOD, AND CURVED SURFACE SCREEN PRINTING DEVICE EQUIPPED WITH BASE MATERIAL RETENTION DEVICE

机译:基本材料保持装置,基本材料保持方法以及配备有基本材料保持装置的弯曲的表面丝网印刷装置

摘要

This base material retention device (1) comprises: a pedestal (2) having a retention surface (21A) on which a base material (G) is placed; a positioning unit (3) configured to position the base material (G) in a predetermined retention position on the retention surface (21A); and a suction unit (4) configured to suction, to the pedestal (2), the base material (G) positioned at the predetermined retention position. The positioning unit (3) includes: a first pressing unit (31) configured to press the base material (G) to the pedestal (2); an outer edge contact member (32) that is provided to the pedestal (2) and that is configured to contact a portion of an outer edge of the base material (G); and a second pressing unit (34) configured to press the outer edge of the base material (G) so as to make the base material (G) contact the outer edge contact member (32).
机译:该基材保持装置(1)包括:具有保持面(21A)的基座(2),在该保持面上载置有基材(G)。定位单元(3),其用于将基材(G)定位在保持表面(21A)上的预定的保持位置中;抽吸单元(4),其将位于预定保持位置的基材(G)抽吸到基座(2)。定位单元(3)包括:第一挤压单元(31),被构造为将基材(G)挤压到基座(2);以及第一挤压单元(3)。外缘接触构件(32),其设置在基座(2)上,并构造成与基材(G)的外缘的一部分接触。第二加压部(34),其对基材(G)的外缘进行加压,以使基材(G)与外缘接触部件(32)接触。

著录项

  • 公开/公告号WO2020153497A1

    专利类型

  • 公开/公告日2020-07-30

    原文格式PDF

  • 申请/专利权人 AGC INC.;

    申请/专利号WO2020JP02611

  • 发明设计人 MATSUDA KEISUKE;TATEYAMA YUUKI;

    申请日2020-01-24

  • 分类号B41F15/20;B41F15/08;

  • 国家 WO

  • 入库时间 2022-08-21 11:10:02

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