PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED

摘要

The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.