首页> 外国专利> SCHOTTKY-TYPE HETEROJUNCTION STRUCTURE, METHOD OF MAKING THE SAME AND SCHOTTKY BARRIER DIODE DEVICE INCLUDING THE SAME

SCHOTTKY-TYPE HETEROJUNCTION STRUCTURE, METHOD OF MAKING THE SAME AND SCHOTTKY BARRIER DIODE DEVICE INCLUDING THE SAME

机译:肖特基型异质结结构,其制造方法以及包括该肖特基型障碍物的肖特基势垒二极管装置

摘要

A Schottky-type heterojunction structure comprises a semiconductor layer and a semimetal layer disposed on the semiconductor layer, wherein the semiconductor layer and the semimetal layer contact each other through Schottky contacts, wherein the semimetal layer includes semimetallic materials whose conduction band and valence band are overlapped or close to overlapped. The interface between the semimetal layer and the semiconductor layer shows improved quality. The Schottky barrier height of the heterojunction shows improved tunability through the modulation by the semimetal layer or the combination of the semimetal layer and the protection layer, and the interface treatments. The Schottky barrier diode (SBD) device based on this heterojunction structure has an ideal factor of about 1.05 and its noise equivalent power (NEP) is lower than 1 pW/Hz1/2.
机译:肖特基型异质结结构包括半导体层和设置在半导体层上的半金属层,其中半导体层和半金属层通过肖特基接触彼此接触,其中半金属层包括导带和价带重叠的半金属材料。或接近重叠。半金属层和半导体层之间的界面显示出改善的质量。异质结的肖特基势垒高度通过半金属层或半金属层和保护层的组合以及界面处理的调制显示出改善的可调谐性。基于这种异质结结构的肖特基势垒二极管(SBD)器件的理想因数约为1.05,其噪声等效功率(NEP)低于1 pW / Hz 1/2

著录项

  • 公开/公告号WO2020192569A1

    专利类型

  • 公开/公告日2020-10-01

    原文格式PDF

  • 申请/专利权人 NANJING UNIVERSITY;

    申请/专利号WO2020CN80341

  • 发明设计人 LU HONG;DING YUANFENG;ZHANG KEDONG;

    申请日2020-03-20

  • 分类号H01L29/47;H01L21/285;H01L29/872;

  • 国家 WO

  • 入库时间 2022-08-21 11:09:18

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号