Structures, methods for manufacturing the structures, compositions for absorbing layer formation, solid-state imaging devices, and image display devices

摘要

A structure having a color filter having excellent light resistance is provided. Moreover, the manufacturing method of the structure which has a color filter excellent in light resistance, the composition for absorption layer formation used for the structure mentioned above, the solid-state image sensor containing the structure mentioned above, and an image display apparatus are provided. The structure has a color filter 10 having two or more different kinds of pixels, and an absorption layer 20 including at least one selected from a yellow colorant and a colorant having a maximum absorption wavelength in a range of 400 to 500 nm. The absorption layer 20 is provided on the light path of at least one pixel of the pixels of the color filter 10 and on the incident side of light to the pixels.