APPARATUS AND METHOD FOR DESIGNING LAYOUT OF PROCESS LINE BASED ON VERTUAL EQUIPMENT

摘要

The apparatus for designing a virtual facility-based process line layout according to an embodiment of the present invention includes a user input device that receives a user parameter from a user, and a unit facility parametric setting device that expresses a characteristic of a unit facility as an equation using the user parameter. do. The virtual facility-based process line layout design device checks the interference between the unit facility and other unit facilities based on the unit facility parametric application device that determines the characteristics of the unit facility by calculating the equation and the property of the unit facility. And a unit facility layout adjusting device configured to adjust the layout of the unit facilities.