In particular, in the formation of an ultrafine pattern (for example, a line width of 50 nm or less), a negative actinic ray capable of forming a pattern excellent in sensitivity, resolution, PED stability, and line edge roughness (LER) performance The mask blank which has a sex or radiation sensitive resin composition and a negative actinic-ray-sensitive or radiation-sensitive film using it, a negative actinic-ray-sensitive or radiation-sensitive film, the pattern formation method, and the electron containing the said pattern formation method Provided is a method of manufacturing a device. Mask blank is, (A) to by a polymer having a repeating unit represented by the general formula (1) compound and, (B) irradiation of actinic ray or radiation, and the volume is 130Å 3 above comprising a compound capable of generating an 2000Å 3 or less acid And a negative actinic ray-sensitive or radiation-sensitive resin composition, and a negative actinic ray-sensitive or radiation-sensitive film and a negative actinic ray-sensitive or radiation-sensitive film using the same. In the formula, R 1 represents a hydrogen atom, an alkyl group, or a halogen atom, R 2 and R 3 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group, or an aryl group, and R 4 represents a hydrogen atom , An alkyl group, a cycloalkyl group, an aryl group, or an acyl group, L represents a single bond or a divalent linking group, Ar represents an aromatic group, and m and n each independently represent an integer of 1 or more.
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