首页> 外国专利> Heat-Sink Substrate For High-Power Semiconductor High-Power Semiconductor Module Comprising The Same And Manufacturing Process Thereof

Heat-Sink Substrate For High-Power Semiconductor High-Power Semiconductor Module Comprising The Same And Manufacturing Process Thereof

机译:用于高功率半导体的大功率半导体模块的散热基板及其制造工艺

摘要

Disclosed are a radiation substrate for a high-power semiconductor, a high-power semiconductor module including the same and a manufacturing method thereof. According to the present invention, the radiation substrate for a high-power semiconductor includes: an electrode metal layer including an electrode pattern in which a high-power semiconductor element is embedded through an insulation groove; a metal base forming a radiator spreading and radiating heat emitted from the high-power semiconductor element through thermal conduction; and an insulation layer having an electric insulation property, and placed between the electrode metal layer and the metal base. The insulation groove includes a part cut vertically from the surface of the electrode metal layer. According to the present invention, since a cross-sectional profile which is almost vertical in a stepped part is formed by cutting at least one part of the insulation groove from which the electrode metal electrode has been removed, excellent insulation performance can be provided. According to the present invention, the manufacturing method can include a cutting step of cutting an insulation groove pattern and an etching groove of etching a remaining part of the insulation groove pattern.
机译:公开了一种用于高功率半导体的辐射基板,包括该辐射基板的高功率半导体模块及其制造方法。根据本发明,用于高功率半导体的辐射基板包括:电极金属层,其包括电极图案,在该电极图案中,高功率半导体元件通过绝缘槽嵌入其中;以及电极层。金属基底形成散热器,该散热器散布并通过热传导散发从高功率半导体元件发出的热量。具有绝缘性的绝缘层设置在电极金属层与金属基底之间。绝缘槽包括从电极金属层的表面垂直切割的部分。根据本发明,由于通过切割已经去除了电极金属电极的绝缘凹槽的至少一部分来形成在台阶部分中几乎垂直的截面轮廓,所以可以提供优异的绝缘性能。根据本发明,该制造方法可以包括:切割步骤,该步骤切割绝缘凹槽图案;以及蚀刻凹槽,其蚀刻绝缘凹槽图案的剩余部分。

著录项

  • 公开/公告号KR102055587B1

    专利类型

  • 公开/公告日2019-12-13

    原文格式PDF

  • 申请/专利权人 LEE JONG EUN;

    申请/专利号KR1020190064286

  • 发明设计人 LEE JONG EUN;

    申请日2019-05-31

  • 分类号H01L23/373;H01L23/14;H01L23/367;

  • 国家 KR

  • 入库时间 2022-08-21 11:08:20

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