APPARATUS AND METHOD FOR INSPECTING EUV (EXTREME ULTRAVIOLET) MASK, AND EUV MASK MANUFACTURING METHOD COMPRISING METHOD

摘要

The purpose of the present invention is to provide an apparatus and method for inspecting an EUV (Extreme Ultraviolet) mask, capable of inspecting the EUV mask at a high speed while maintaining a high light efficiency; and an EUV mask manufacturing method using the method. The apparatus for inspecting the EUV mask includes: a light source which generates and outputs light; a linear zone plate which outputs light from the light source into light in the form of a line; a slit plate which blocks higher diffraction light components from the light in the form of line to output the higher diffraction light component-blocked light; a stage on which the EUV mask, i.e., an inspection object is disposed; and a detector which detects light reflected after light is irradiated onto the EUV mask from the slit plate.;COPYRIGHT KIPO 2020