Exposure equipment and exposure methods.

摘要

An exposure apparatus and method are disclosed. The exposure apparatus includes a control system, a light source system, a plurality of illumination systems, and a plurality of projection objective lenses 30. The light source system is configured to emit a plurality of first illumination beams incident on the illumination system, each illumination system including a variable attenuator 20 and a branch energy detector 51. The branch energy detector 51 is configured to detect the illumination level of the second illumination beam generated in the corresponding illumination system and feed it back to the control system, while the control system controls each variable by controlling each variable attenuator 20. And adjust the illuminance level of the second illumination beam in the system. The exposure apparatus and method have improved exposure performance and allow finer and faster energy adjustments to enable precise control and higher exposure accuracy.