RF RF RADIO FREQUENCY RF SIGNAL SOURCE SUPPLYING RF PLASMA GENERATOR AND REMOTE PLASMA GENERATOR

摘要

A multi-signal radio frequency (RF) source comprises: an RF source; and a switch including an input unit communicating with an output unit of the RF source, a first output unit, and a second output unit. The switch is configured to selectively connect one of the first output unit and the second output unit to the input unit. An RF generator communicating with the first output unit of the multi-signal RF source is configured to generate plasma in a processing chamber. A remote plasma generator communicating with the second output unit of the multi-signal RF source is configured to supply remote plasma to the processing chamber.