MASK BLANKS HALF-TONE MASK METHOD OF MANUFACTURING MASK BLANKS AND METHOD OF MANUFACTURING HALF-TONE MASK

摘要

The present invention relates to mask blanks comprising: a transparent substrate; a half-tone layer having Cr laminated on a surface of the transparent substrate as a main component; an etching stopper layer laminated on the half-tone layer; and a light blocking layer having Cr laminated on the etching stopper layer as a main component. The etching stopper layer consists of a metal silicide compound, and the composition ratio of Si to a metal in the etching stopper layer is set in a range of 2.0 to 3.7.