首页> 外国专利> ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND ELECTRON BEAM IMAGE ACQUIRING METHOD

ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND ELECTRON BEAM IMAGE ACQUIRING METHOD

机译:电子束图像获取装置和电子束图像获取方法

摘要

One aspect of the present invention relates to an electron beam image acquisition apparatus and electron beam image acquisition method, capable of detecting secondary electrons with high accuracy. According to one aspect of the present invention, the electron beam image acquisition apparatus includes: a first electrostatic lens group for correcting a shift amount of a focus position of a primary electron beam from a reference position on a surface of a substrate, which is generated according to a movement of a stage, and correcting a plurality of variation amounts of the primary electron beam on the surface of the substrate, which are generated by correcting the shift amount of the focus position of the primary electron beam; and a second electrostatic lens group for correcting a plurality of variation amounts of an image of a secondary electron beam, which is emitted from the substrate by irradiating the substrate with the primary electron beam corrected by the first electrostatic lens group, and passes through at least one electrostatic lens of the first electrostatic lens group.
机译:本发明的一个方面涉及一种能够高精度地检测二次电子的电子束图像获取装置和电子束图像获取方法。根据本发明的一个方面,电子束图像获取设备包括:第一静电透镜组,用于校正所产生的一次电子束的焦点位置相对于基板表面上的基准位置的偏移量。根据台架的移动,校正基板表面上的一次电子束的多个变化量,该变化量是通过校正一次电子束的聚焦位置的偏移量而产生的;第二静电透镜组,用于校正二次电子束的图像的多个变化量,该二次电子束的图像通过向基板照射由第一静电透镜组校正的一次电子束而从基板发射并至少通过第一静电透镜组中的一个静电透镜。

著录项

  • 公开/公告号KR20200063982A

    专利类型

  • 公开/公告日2020-06-05

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC.;

    申请/专利号KR20190150379

  • 发明设计人 INOUE KAZUHIKO;ANDO ATSUSHI;

    申请日2019-11-21

  • 分类号G03F7/20;G03F9;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:49

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