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METHOD OF PREPARING POLYMER INSULATOR THIN FILM USING INITIATED CHEMICAL VAPOR DEPOSITION AND POLYMER INSULATOR THIN FILM PREPARED BY THE METHOD
METHOD OF PREPARING POLYMER INSULATOR THIN FILM USING INITIATED CHEMICAL VAPOR DEPOSITION AND POLYMER INSULATOR THIN FILM PREPARED BY THE METHOD
The present invention relates to a technique for manufacturing a diacrylate-based polymer insulating film using an initiator chemical vapor deposition method (initiated chemical vapor deposition; iCVD), a chemical vapor deposition method using an initiator (initiated Synthesizing a diacrylate-based polymer using chemical vapor deposition (iCVD), using the synthesized cross-linking polymer as a blocking dielectric layer, and over the blocking dielectric layer And forming a polymer polymer through an iCVD process and depositing the polymer polymer on the blocking dielectric layer to form a polymer insulating layer exhibiting memory characteristics.
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