Chemical supplier processing apparatus including the chemical supplier and method of processing a substrate using the cleaning apparatus

摘要

Disclosed are a wet liquid chemical feeder and a wet treatment apparatus having the same. The chemical liquid feeder is heated only at the time of performing the wet processing process by an inline heater disposed on the chemical liquid supply line for supplying the chemical liquid mixture to the process chamber or the source supply line for supplying the source material constituting the chemical liquid mixture, but not in the atmospheric state. . Accordingly, the operating cost of the chemical liquid feeder can be reduced. On the other hand, the inside of the chemical storage tank is configured as a closed space to increase the internal pressure to prevent the evaporation of the source material. Accordingly, it is possible to increase the service time of the chemical mixture and to reduce the waste volume.