METHODS AND APPARATUSES FOR EFFECTIVELY REDUCING GAS RESIDENCE TIME IN A PLASMA PROCESSING CHAMBER

摘要

Methods and apparatus are disclosed for controlling plasma generation within a plasma processing chamber to reduce the effective residence time of byproduct gases or to control the concentration of a particular polymer precursor or reaction byproducts in real time in the plasma processing chamber. Gas residence time is "effectively" reduced by reducing the plasma reaction for at least a portion of the process time. Thresholds may be provided to control when the plasma reaction is allowed to proceed at full rate and when the plasma reaction is allowed to proceed at reduced rate. By reducing the plasma byproduct generation rate for at least a portion of the process time, the byproduct gas residence time may be effectively reduced to improve process results.