首页> 外国专利> THIN FILM TRANSISTOR AND VERTICAL NON-VOLATILE MEMORY DEVICE INCLUDING TRANSITION METAL-INDUCED POLYCRYSTALLINE METAL OXIDE CHANNEL LAYER AND ALUMINIUM OXIDE LAYER

THIN FILM TRANSISTOR AND VERTICAL NON-VOLATILE MEMORY DEVICE INCLUDING TRANSITION METAL-INDUCED POLYCRYSTALLINE METAL OXIDE CHANNEL LAYER AND ALUMINIUM OXIDE LAYER

机译:薄膜晶体管和垂直非挥发性存储器件,包括过渡金属诱导的多晶金属氧化物通道层和氧化铝层

摘要

The present invention provides a vertical nonvolatile memory device and a thin film transistor. The vertical nonvolatile memory device includes an insulating pillar extending in an upper direction of the substrate. Interlayer insulating layers and control gate patterns alternately stacked on the side of the insulating pillar are disposed. Between the insulating pillar and the control gate patterns, a polycrystalline metal oxide channel layer extending along the insulating pillar is stacked on the insulating pillar. A tunnel insulating film, a charge trapping layer, and a blocking insulating film, which are aluminum oxide films, are sequentially disposed between the polycrystalline metal oxide channel layer and the respective control gate patterns.
机译:本发明提供了一种垂直非易失性存储器件和薄膜晶体管。垂直非易失性存储装置包括在基板的上方延伸的绝缘柱。设置交替地堆叠在绝缘柱的侧面上的层间绝缘层和控制栅图案。在绝缘柱和控制栅图案之间,沿绝缘柱延伸的多晶金属氧化物沟道层堆叠在绝缘柱上。作为氧化铝膜的隧道绝缘膜,电荷俘获层和阻挡绝缘膜顺序地设置在多晶金属氧化物沟道层与各个控制栅极图案之间。

著录项

  • 公开/公告号KR102076057B1

    专利类型

  • 公开/公告日2020-02-11

    原文格式PDF

  • 申请/专利权人 한양대학교 산학협력단;

    申请/专利号KR20180088622

  • 发明设计人 최창환;송윤흡;정재경;한훈희;

    申请日2018-07-30

  • 分类号H01L29/786;H01L21/02;H01L21/324;H01L27/11556;H01L27/11582;H01L29/51;

  • 国家 KR

  • 入库时间 2022-08-21 11:05:19

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