首页> 外国专利> Pretreatment of Thick-Film Aluminum Electrode for Metal Plating

Pretreatment of Thick-Film Aluminum Electrode for Metal Plating

机译:用于金属电镀的厚膜铝电极的预处理

摘要

The present invention relates to a method of pretreating a thick film aluminum electrode for metal plating, wherein the thick film aluminum electrode is pretreated for subsequent metal plating, the pretreatment being purely mechanical treatment, purely chemical alkali / acid cleaning treatment, mechanical And a mixture of chemical treatments or chemically suitable anodization, the surface of the thick film aluminum electrode is evened, the alumina, nonconductive material removed on the surface, the thick film aluminum electrode to obtain a surface having an even and low oxygen content and Also, thereby, the new thick film aluminum electrode has a quality similar to that of the precious metal silver thick film electrode for subsequent metal plating.
机译:本发明涉及一种用于金属镀覆的厚膜铝电极的预处理方法,其中对该厚膜铝电极进行预处理以用于随后的金属镀覆,该预处理为纯机械处理,纯化学碱/酸清洗处理,机械和混合物。在进行化学处理或化学上合适的阳极氧化后,将厚膜铝电极的表面弄平,除去氧化铝,非导电材料的表面,在厚膜铝电极上得到氧含量低且均匀的表面,进而,新的厚膜铝电极的质量与用于后续金属电镀的贵金属银厚膜电极的质量相似。

著录项

  • 公开/公告号KR102079429B1

    专利类型

  • 公开/公告日2020-02-19

    原文格式PDF

  • 申请/专利权人 내셔널 청쿵 유니버시티;

    申请/专利号KR20170177179

  • 发明设计人 웬-시 리;

    申请日2017-12-21

  • 分类号C25D5/44;B24B31/02;C23G1/12;C23G1/22;C25D11/18;C25D17/10;C25D5/04;

  • 国家 KR

  • 入库时间 2022-08-21 11:05:19

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号