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Pretreatment of Thick-Film Aluminum Electrode for Metal Plating
Pretreatment of Thick-Film Aluminum Electrode for Metal Plating
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机译:用于金属电镀的厚膜铝电极的预处理
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摘要
The present invention relates to a method of pretreating a thick film aluminum electrode for metal plating, wherein the thick film aluminum electrode is pretreated for subsequent metal plating, the pretreatment being purely mechanical treatment, purely chemical alkali / acid cleaning treatment, mechanical And a mixture of chemical treatments or chemically suitable anodization, the surface of the thick film aluminum electrode is evened, the alumina, nonconductive material removed on the surface, the thick film aluminum electrode to obtain a surface having an even and low oxygen content and Also, thereby, the new thick film aluminum electrode has a quality similar to that of the precious metal silver thick film electrode for subsequent metal plating.
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