Continuous Vapor Deposition Device and Continuous Deposition Method

摘要

The present invention provides an apparatus and method capable of continuously coating at a constant coating composition and speed. In one embodiment, a deposition apparatus for coating two or more compounds or elements on a substrate, wherein the two or more compounds or elements are coated with a plurality of high A supply unit supplying the upper body; A heating unit for forming a vapor by melting and evaporating the solid body supplied from the supply unit; A buffer part connected to the heating part and mixed with steam generated before the steam stays; And a nozzle connected to the buffer portion and having an opening formed toward the substrate.