METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK METHOD FOR MANUFACTURING MASK BLANK METHOD FOR MANUFACTURING TRANSFER MASK METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND INSPECTING APPARATUS

摘要

An object of the present invention is to properly inspect the presence or absence of defects in a translucent substrate in a method for manufacturing a mask blank substrate. It is a method of manufacturing a substrate for a mask blank, and the inspection position 302 of the inspection surface of the other main surface through the optical member 102 optically connected via one main surface of the transparent substrate 10 and a liquid is interposed. It has an inspection process for irradiating in the direction of total reflection from, and detecting the presence or absence of inspection light leaking from a position other than the planned exit position of the optical member 102, the inspection process being the first direction in which the inspection light is totally reflected at inspection position 302 Irradiated in the direction, the inspection light totally reflected at the inspection position 302 is introduced into the optical member 102, and the direction of the introduced inspection light is a direction different from the first direction, and the direction totally reflected at the inspection position 302 The inspection light is also irradiated to the inspection position 302 in the second direction by reflecting in the optical member 102 so as to be the phosphorus second direction.