EUV reticle pods are provided. The pod includes inner and outer box assemblies. The inner box assembly contained within the outer box assembly includes a base and a cover. The base has a top surface and a peripheral wall. The top surface includes a transport surface, at least one trench, and a first contact surface. The EUV reticle is carried over the transport surface. The trench has a circular loop structure and its bottom is lower than the conveying surface. The conveying surface, trench and first contact surface are sequentially distributed from the center of the top surface toward the peripheral wall. The cover has a recess for receiving the EUV reticle and a second contact surface that cooperates with the first contact surface to form an airtight seal. Trench captures and traps particles to reduce particle contamination of the reticle.
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