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Vacuum Evaporation Coating Apparatus for Coating Multiple Substrates using Revolution Rotation and Tilting

机译:用于通过旋转旋转和倾斜涂覆多个基板的真空蒸发镀膜设备

摘要

The multi-substrate vacuum deposition apparatus includes a chamber, a dome portion, an idle portion, and a rotating portion. The dome portion is embedded in the chamber and closes at least the upper side of the interior space of the chamber. The revolving portion has one side coupled to the upper outside of the chamber, the other side penetrates the upper portion of the chamber to engage the dome portion, and rotates the dome portion through rotation. The rotating part rotates and rotates the substrate while one side is coupled to the other side of the revolving portion to rotate and tilt, and the other side passes through the dome portion to fix and rotate the substrate.
机译:该多基板真空沉积设备包括腔室,圆顶部分,空转部分和旋转部分。圆顶部嵌入腔室中并且至少封闭腔室的内部空间的上侧。旋转部分的一侧连接到腔室的上部外部,另一侧穿过腔室的上部以接合圆顶部分,并通过旋转使圆顶部分旋转。旋转部分使基板旋转和旋转,同时一侧耦合到旋转部分的另一侧以旋转和倾斜,而另一侧穿过圆顶部分以固定和旋转基板。

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