METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING ORGANIC UNDERLAYER FILM-FORMING COMPOSITION FOR SOLVENT DEVELOPMENT LITHOGRAPHY PROCESSES

摘要

[Problem] A method of manufacturing a semiconductor device using a lower layer film material capable of forming a good pattern without deteriorating the resolution limit is provided. [Solutions] A process of forming an organic underlayer film on a semiconductor substrate, a process of forming an inorganic hard mask thereon, a process of forming a resist film thereon, and a process of forming a resist pattern by irradiating light or electron beams and solvents. In the process of etching the inorganic hard mask by a resist pattern, the process of etching the organic underlayer film by a patterned inorganic hard mask, and the process of processing a semiconductor substrate by the patterned organic underlayer film, the organic The organic layer obtained by application and heating of an organic underlayer film forming composition comprising an organic solvent and a compound containing an organic group having a functional group selected from the group consisting of an underlayer film, an epoxy group, an isocyanate group, a block isocyanate group, and a benzocyclobutene ring group A method for manufacturing a semiconductor device, which is a lower layer film.