DEVELOPING SOLUTION AND DEVELOPMENT PROCESSING METHOD OF PHOTOSENSITIVE RESIN COMPOSITION

摘要

[Problem] A developer for a polyimide precursor that can increase the development margin, does not decrease the film thickness of the polyimide resin film well in the development process, and has high safety, and a method for developing a photosensitive polyimide resin composition using this developer , And a pattern formation method using this developing treatment method. [Solution] The developer for a polyimide precursor according to the present invention contains (a) N,N,N',N'-tetramethylurea and (b) a lower alcohol having 1 to 5 carbon atoms. A method for developing a photosensitive polyimide resin composition according to the present invention includes a step of developing a photosensitive polyimide precursor resin composition in which at least a portion of the photosensitive polyimide resin composition has been exposed with the developer solution for a polyimide precursor. The pattern formation method according to the present invention includes a forming step of forming a coated film or molded article made of a photosensitive polyimide precursor resin composition, an exposure step of selectively exposing the coated film or molded article, and developing the coated film or molded article after exposure. It includes a developing step developed by a treatment method.