Self-assembled patterning using patterned hydrophobic surfaces

摘要

Embodiments provided herein relate to self-assembled methods of making patterned surfaces for sequencing including patterned surfaces or patterned flow cells, for example for digital fluidics devices. The method uses photolithography to create a patterned surface having a plurality of microscale or nanoscale contours separated by hydrophobic intervening regions without the need for oxygen plasma treatment during the photolithography process. In addition, the method avoids the use of any chemical or mechanical polishing steps after deposition of the gel material to the contour.