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METHOD OF USING PLATINUM METALLIZATION IN SYSTEM OF REDISTRIBUTION OF CONTACT PADS OF CRYSTALS OF INTEGRATED MICROCIRCUITS AND SEMICONDUCTOR DEVICES

机译:集成微电路和半导体器件的晶体接触板再分配系统中使用铂金属化的方法

摘要

FIELD: physics; electricity.;SUBSTANCE: invention relates to electronics and is intended for redistribution of contact areas of semiconductor crystals of integrated microcircuits, hybrid integrated circuits, micro-assemblies, modules, microelectromechanical systems and sensors on a semiconductor wafer by creating additional thin-film layers and platinum-based plating. Summary of invention is that method of redistribution of contact areas of crystal based on platinum metallisation of integrated circuits involves depositing on semiconductor plate with formed semiconductor structures of aluminum metal coating contact pads and passivation layer SiO2 or Si3N4, additional repassiving layer of SiO2 or Si3N4 with subsequent opening of windows for initial contact pads of crystals on semiconductor plate, applying on the entire surface of the plate of the conducting adhesive and barrier layers of titanium nitride TiN or together titanium and titanium nitride Ti/TiN, application on the adhesive layer of the main metallisation layer - platinum Pt to create topological thin-film structures of electrical communication lines for redistribution of contact areas in the matrix of contact pads over the entire surface area of the crystal, application of plating of adhesion and barrier layers of titanium nitride TiN or together titanium and titanium nitride Ti/TiN, application of upper protective layer, opening in it of windows under contact pads to surface of platinum metallisation, formation in opened windows of contact areas of solder ball leads on platinum metallization.;EFFECT: technical result is possibility of forming uniformly redistributed on planar side of contact pads on entire surface of semiconductor plate, which enables to create a free matrix of soldered joints, which is limited only by the geometric dimensions of the semiconductor crystal and the required number of electrical contacts for mounting by flip-chip method.;1 cl, 15 dwg
机译:领域:物理学;物质:本发明涉及电子设备,并且旨在通过在半导体晶片上形成附加的薄膜层和层,来重新分布集成电路微电路,混合集成电路,微组件,模块,微机电系统和传感器的半导体晶体的接触面积。铂基电镀。发明内容是基于集成电路的铂金属化来重新分配晶体的接触区域的方法,该方法涉及在具有铝金属涂层接触垫和钝化层SiO 2 或Si < Sub> 3 N 4 ,SiO 2 或Si 3 N 4 的附加钝化层随后打开窗口以打开半导体板上晶体的初始接触垫的窗口,将其涂覆在导电粘合剂板的整个表面上,并涂覆氮化钛TiN或阻挡层钛和氮化钛Ti / TiN的势垒层,并涂覆在半导体的粘合剂层上主要金属化层-铂铂金,用于建立电通信线路的拓扑薄膜结构,用于在晶体整个表面上重新分布接触垫矩阵中的接触面积,并施加镀钛的粘附层和阻挡层氮化钛或钛和氮化钛Ti / TiN,施加上保护层,在接触垫下方的窗口中开口至铂金属化表面,在铂金属化时在焊球引线接触区域的开口窗口中形成。技术结果是有可能在半导体板的整个表面上的接触垫的平面侧均匀地重新分布,从而能够创建自由的焊接接头矩阵,该矩阵仅受半导体晶体的几何尺寸和所需的电数量限制倒装芯片安装触点; 1 cl,15 dwg

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