METHOD OF PRODUCING ELECTROTECHNICAL THIN FILMS AT ROOM TEMPERATURE AND ELECTROTECHNICAL THIN FILM

摘要

FIELD: manufacturing technology; technological processes.;SUBSTANCE: invention can be used to produce an electrotechnical thin film. Essence of the invention is that in the method of producing electrotechnical thin films at room temperature by providing electroconductive and/or semiconductor inorganic agglomerates in the dispersion on the surface and curing them to form a layer, curing is carried out at room temperature and curing is accelerated by bringing into contact with at least one reagent, where the dispersion is in form of an aqueous wet dispersion—an aqueous wet dispersion, where the room temperature is temperature of 10 °C to 60 °C, where electrotechnical thin film is modified on the edge in an incompletely cured state by means of at least one acid halide reagent, or at least one redox reagent selected from a group consisting of halogen, a halogen compound and a chalcogen, fluorine, chlorine, bromine, iodine, hypogalite, halite, halogenate, perhalogenate, light photons of UV range, oxygen, oxygen enriched with ozone, ozone, perborate, percarbonate, peroxodisulphate, or at least one acidic or basic reagent selected from a group consisting of halogenhydrogen, acid hypogalite, acid halite, halogen-containing acid, halogen-containing peracid, hypochlorous acid, chloride acid, chloric acid, perchloric acid, dry CO₂, dry NH₃, thionyl chloride, sulphuryl chloride, phosphorus oxychloride, phosphorus trichloride.;EFFECT: possibility of creating thin, strong and stable films.;5 cl, 2 dwg