METHOD OF PRODUCING ELECTROTECHNICAL THIN FILMS AT ROOM TEMPERATURE, USE THEREOF AND HEATING SYSTEM BASED ON THIN FILMS OBTAINED USING SAID METHOD

摘要

FIELD: manufacturing technology; technological processes.;SUBSTANCE: invention can be used for production of electrotechnical thin films. Summary of the invention is that a method of producing electrotechnical thin films at room temperature, in particular a base layer, wherein conductive and/or semiconductor inorganic agglomerates are provided in the surface dispersion and cured to form a layer, wherein curing is carried out at room temperature, curing is accelerated by bringing into contact with at least one reagent, at least one applied base layer is a layer containing agglomerates of at least one chain-forming element, wherein the chain-forming element consists of carbon, wherein base layer in form of mainly aqueous carbon-containing suspension containing at least microdimensional graphite with amorphous carbon component and optionally up to 49 % of additives from soot, activated carbon, resin, conductive soot, furnace black, carbon black, lamp soot, soot ESD, mixed with powder of at least one metal, which is powder of metal soluble in bases with particle size of not more than micrometer range, preferably at least one metal from group consisting of silicon, aluminum, gallium, indium, magnesium, calcium, barium, iron, cobalt, nickel, copper, zinc, more preferably silicon, aluminum and iron, the pH of the suspension is brought to the value required for the reaction, which is more than 7, and wherein it is applied as a reducing layer and subjected to preliminary hardening at least to obtain a stabilized edge coating, wherein the suspension applied by the thin layer, is cured, at least, by exposure to concomitant UV radiation.;EFFECT: possibility of producing thin films which are solid, stable, preferentially suitable as a heating layer.;10 cl, 2 dwg