OPTICAL ARRANGEMENT AND LITHOGRAPH SYSTEM

摘要

Optical arrangement (200) for a lithography system (100A, 100B), comprising a microsystem (202) with a mirror array (204), wherein a respective mirror (206) of the mirror array (204) is set up to emit work light (108A, 108B) Lithography system (100A, 100B) on its front side (208) and a measuring beam (L, 224) on its rear side (220) to reflect one or more radiation sources (226, 310) which are set up to reflect the respective measuring beam (L, 224), and one or more sensor units (230, 804, 1200) which are set up to detect a tilt angle (α) of a respective mirror (206) as a function of the respective reflected measuring beam (L ', 224').