An optical system (200) for a lithography system (100A, 100B), comprising an optical element (202), a force actuator (212) which is designed to apply a force (F) to the optical element (202) in order to adjust it , and a damping device (300) for damping vibration modes of the optical element (202), wherein the damping device (300) is arranged between the optical element (202) and the force actuator (212) in such a way that a force path (FP) of the force ( F) takes its way over the damping device (300).
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