Field facet mirror for an illumination optics of a projection exposure system

摘要

The invention relates to a field facet mirror (13) for an illumination optics (4) of a projection exposure system (1), comprising a plurality of field facets (19) which are arranged in a plurality of bars (20) each extending along a bar axis (31), each with a plurality of field facets (19 ) are arranged, the field facets (19) in a bolt (20) depending on their position along the bolt axis (31) having reflecting surfaces with systematically changing dimensions transversely to the bolt axis (31) and / or wherein two bolt axes (31) of different bolts (20) are each tilted against each other.